IMPURITY-SITE DISTRIBUTION OF IMPLANTED BI IN IRON AND NICKEL STUDIED BY CHANNELING AND NUCLEAR ORIENTATION

被引：15

作者：

CALLAGHAN, PT

KITTEL, P

STONE, NJ

JOHNSTON, PD

机构：

[1] UNIV OXFORD, NUCL PHYS LAB, OXFORD, ENGLAND

[2] UNIV OXFORD, CLARENDON LAB, MULLARD CRYOMAGNETIC LAB, OXFORD, ENGLAND

来源：

关键词：

D O I：

10.1103/PhysRevB.14.3722

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3722 / 3731

页数：10

共 30 条

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