THE STRUCTURAL, CHEMICAL AND COMPOSITIONAL NATURE OF AMORPHOUS-SILICON CARBIDE FILMS

被引：38

作者：

HICKS, SE ^{[1
]}

FITZGERALD, AG ^{[1
]}

BAKER, SH ^{[1
]}

DINES, TJ ^{[1
]}

机构：

[1] UNIV DUNDEE,DEPT CHEM,DUNDEE DD1 4HN,SCOTLAND

来源：

PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1990年 / 62卷 / 02期

关键词：

D O I：

10.1080/13642819008226986

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A range of amorphous hydrogenated silicon-carbide films have been produced using the plasma-enhanced chemical-vapour deposition technique with silane and methane diluted in hydrogen as the parent molecules. The air-exposed and sputter- cleaned surfaces of these films have been investigated by means of X-ray photoelectron spectroscopy. Auger electron spectroscopy, secondary-ion mass spectrometry, Raman spectroscopy and reflection-electron diffraction. The structural and chemical nature of the films has been determined as a function of the methane: silane ratio by a combination of the above techniques. X-ray photoelectron spectroscopy and Auger electron spectroscopy have been used to determine the carbon content of the films also as a function of the methane: silane ratio. © 1990 Taylor & Francis Ltd.

引用

页码：193 / 212

页数：20