LOW-LOSS ZRO2 FILMS FOR OPTICAL APPLICATIONS IN THE UV REGION

[1] USE OF HAFNIUM DIOXIDE IN MULTILAYER DIELECTRIC REFLECTORS FOR NEAR UV [J]. APPLIED OPTICS, 1977, 16 (02): : 439 - 444

[2] HUI Y, 1984, APR TOP M OPT INT CO

[3] HIGH BAND-GAP OXIDE OPTICAL COATINGS FOR 0.25 AND 1.06 MU-M FUSION LASERS [J]. THIN SOLID FILMS, 1980, 73 (01) : 169 - 175

[4] PULKER HK, 1976, THIN SOLID FILMS, V34, P343, DOI 10.1016/0040-6090(76)90483-1

[5] CHARACTERIZATION OF OPTICAL THIN-FILMS [J]. APPLIED OPTICS, 1979, 18 (12): : 1969 - 1977

[6] SCANDIUM OXIDE COATINGS FOR HIGH-POWER UV LASER APPLICATIONS [J]. APPLIED OPTICS, 1982, 21 (20): : 3685 - 3688

[7] DETERMINATION OF THE THICKNESS AND OPTICAL-CONSTANTS OF AMORPHOUS-SILICON [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1983, 16 (12): : 1214 - 1222

[1] USE OF HAFNIUM DIOXIDE IN MULTILAYER DIELECTRIC REFLECTORS FOR NEAR UV [J]. APPLIED OPTICS, 1977, 16 (02): : 439 - 444

[2] HUI Y, 1984, APR TOP M OPT INT CO

[3] HIGH BAND-GAP OXIDE OPTICAL COATINGS FOR 0.25 AND 1.06 MU-M FUSION LASERS [J]. THIN SOLID FILMS, 1980, 73 (01) : 169 - 175

[4] PULKER HK, 1976, THIN SOLID FILMS, V34, P343, DOI 10.1016/0040-6090(76)90483-1

[5] CHARACTERIZATION OF OPTICAL THIN-FILMS [J]. APPLIED OPTICS, 1979, 18 (12): : 1969 - 1977

[6] SCANDIUM OXIDE COATINGS FOR HIGH-POWER UV LASER APPLICATIONS [J]. APPLIED OPTICS, 1982, 21 (20): : 3685 - 3688

[7] DETERMINATION OF THE THICKNESS AND OPTICAL-CONSTANTS OF AMORPHOUS-SILICON [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1983, 16 (12): : 1214 - 1222