DIELECTRIC ISOLATION - COMPREHENSIVE, CURRENT AND FUTURE

被引：46

作者：

BEAN, KE ^{[1
]}

RUNYAN, WR ^{[1
]}

机构：

[1] TEXAS INSTR INC, DALLAS, TX 75222 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 01期

关键词：

D O I：

10.1149/1.2133246

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C5 / C12

页数：8

共 50 条

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[10] OPTIMIZATION OF HYDRAZINE-WATER SOLUTION FOR ANISOTROPIC ETCHING OF SILICON IN INTEGRATED-CIRCUIT TECHNOLOGY [J].

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