UNIDIRECTIONAL DEPOSITION OF ALUMINUM USING NOZZLE JET BEAM TECHNIQUE

[1] BLECH IA, 1983, SOLID STATE TECHNOL, V26, P123

[2] Broom R. F., 1980, IBM Technical Disclosure Bulletin, V22, P5086

[3] DIRKS AG, 1977, THIN SOLID FILMS, V47, P1219

[4] FOSTER T, 1979, IBM TECH DISCL B, V21, P4660

[5] Griffing B. F., 1983, ELECTRON DEVICE LETT, V4, P14

[6] ION CLUSTER BEAM DEPOSITION OF SILVER AND GERMANIUM ON SILICON [J]. JOURNAL OF CRYSTAL GROWTH, 1981, 51 (01) : 17 - 40

[7] MILGRAM AA, 1983, J VAC SCI TECHNOL B, V1, P493

[8] NOZZLE BEAM DEPOSITION OF SIO2-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 453 - 456

[9] VAPORIZED-METAL CLUSTER FORMATION AND IONIZED-CLUSTER BEAM DEPOSITION AND EPITAXY [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 105 - 115

[10] YAMADA I, 1982, J APPL PHYS, V56, P2756

[1] BLECH IA, 1983, SOLID STATE TECHNOL, V26, P123

[2] Broom R. F., 1980, IBM Technical Disclosure Bulletin, V22, P5086

[3] DIRKS AG, 1977, THIN SOLID FILMS, V47, P1219

[4] FOSTER T, 1979, IBM TECH DISCL B, V21, P4660

[5] Griffing B. F., 1983, ELECTRON DEVICE LETT, V4, P14

[6] ION CLUSTER BEAM DEPOSITION OF SILVER AND GERMANIUM ON SILICON [J]. JOURNAL OF CRYSTAL GROWTH, 1981, 51 (01) : 17 - 40

[7] MILGRAM AA, 1983, J VAC SCI TECHNOL B, V1, P493

[8] NOZZLE BEAM DEPOSITION OF SIO2-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 453 - 456

[9] VAPORIZED-METAL CLUSTER FORMATION AND IONIZED-CLUSTER BEAM DEPOSITION AND EPITAXY [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 105 - 115

[10] YAMADA I, 1982, J APPL PHYS, V56, P2756