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CHARACTERIZATION OF PLASMA SILICON-NITRIDE LAYERS
被引:153
作者
:
CLAASSEN, WAP
论文数:
0
引用数:
0
h-index:
0
CLAASSEN, WAP
VALKENBURG, WGJN
论文数:
0
引用数:
0
h-index:
0
VALKENBURG, WGJN
HABRAKEN, FHPM
论文数:
0
引用数:
0
h-index:
0
HABRAKEN, FHPM
TAMMINGA, Y
论文数:
0
引用数:
0
h-index:
0
TAMMINGA, Y
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1983年
/ 130卷
/ 12期
关键词
:
D O I
:
10.1149/1.2119600
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:2419 / 2423
页数:5
相关论文
共 7 条
[1]
HYDROGEN CONTENT OF A VARIETY OF PLASMA-DEPOSITED SILICON NITRIDES
CHOW, R
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
CHOW, R
LANFORD, WA
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
LANFORD, WA
WANG, KM
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
WANG, KM
ROSLER, RS
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
ROSLER, RS
[J].
JOURNAL OF APPLIED PHYSICS,
1982,
53
(08)
: 5630
-
5633
[2]
CLAASSEN WAP, 1983, 4TH P EUR C CHEM VAP
[3]
CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AND THERMALLY GROWN SILICON-NITRIDE FILMS
HABRAKEN, FHPM
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
HABRAKEN, FHPM
KUIPER, AET
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
KUIPER, AET
VANOOSTROM, A
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
VANOOSTROM, A
TAMMINGA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
TAMMINGA, Y
THEETEN, JB
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
THEETEN, JB
[J].
JOURNAL OF APPLIED PHYSICS,
1982,
53
(01)
: 404
-
415
[4]
LANFORD WA, 1978, J APPL PHYS, V49, P2472
[5]
ROSLER RS, 1976, SOLID STATE TECHNOL, V19, P45
[6]
THE CORRELATIONS BETWEEN PHYSICAL AND ELECTRICAL-PROPERTIES OF PECVD SIN WITH THEIR COMPOSITION RATIOS
SAMUELSON, GM
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
SAMUELSON, GM
MAR, KM
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
MAR, KM
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1982,
129
(08)
: 1773
-
1778
[7]
REACTIVE PLASMA DEPOSITED SI-N FILMS FOR MOS-LSI PASSIVATION
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
LEVINSTEIN, HJ
论文数:
0
引用数:
0
h-index:
0
LEVINSTEIN, HJ
SMITH, TE
论文数:
0
引用数:
0
h-index:
0
SMITH, TE
QUINTANA, G
论文数:
0
引用数:
0
h-index:
0
QUINTANA, G
HASZKO, SE
论文数:
0
引用数:
0
h-index:
0
HASZKO, SE
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
: 601
-
608
←
1
→
共 7 条
[1]
HYDROGEN CONTENT OF A VARIETY OF PLASMA-DEPOSITED SILICON NITRIDES
CHOW, R
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
CHOW, R
LANFORD, WA
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
LANFORD, WA
WANG, KM
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
WANG, KM
ROSLER, RS
论文数:
0
引用数:
0
h-index:
0
机构:
SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
ROSLER, RS
[J].
JOURNAL OF APPLIED PHYSICS,
1982,
53
(08)
: 5630
-
5633
[2]
CLAASSEN WAP, 1983, 4TH P EUR C CHEM VAP
[3]
CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AND THERMALLY GROWN SILICON-NITRIDE FILMS
HABRAKEN, FHPM
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
HABRAKEN, FHPM
KUIPER, AET
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
KUIPER, AET
VANOOSTROM, A
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
VANOOSTROM, A
TAMMINGA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
TAMMINGA, Y
THEETEN, JB
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
THEETEN, JB
[J].
JOURNAL OF APPLIED PHYSICS,
1982,
53
(01)
: 404
-
415
[4]
LANFORD WA, 1978, J APPL PHYS, V49, P2472
[5]
ROSLER RS, 1976, SOLID STATE TECHNOL, V19, P45
[6]
THE CORRELATIONS BETWEEN PHYSICAL AND ELECTRICAL-PROPERTIES OF PECVD SIN WITH THEIR COMPOSITION RATIOS
SAMUELSON, GM
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
SAMUELSON, GM
MAR, KM
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
MOTOROLA SEMICOND GRP,PHOENIX,AZ 85008
MAR, KM
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1982,
129
(08)
: 1773
-
1778
[7]
REACTIVE PLASMA DEPOSITED SI-N FILMS FOR MOS-LSI PASSIVATION
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
LEVINSTEIN, HJ
论文数:
0
引用数:
0
h-index:
0
LEVINSTEIN, HJ
SMITH, TE
论文数:
0
引用数:
0
h-index:
0
SMITH, TE
QUINTANA, G
论文数:
0
引用数:
0
h-index:
0
QUINTANA, G
HASZKO, SE
论文数:
0
引用数:
0
h-index:
0
HASZKO, SE
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
: 601
-
608
←
1
→