CHARACTERIZATION OF PLASMA SILICON-NITRIDE LAYERS

被引：153

作者：

CLAASSEN, WAP

VALKENBURG, WGJN

HABRAKEN, FHPM

TAMMINGA, Y

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 12期

关键词：

D O I：

10.1149/1.2119600

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：2419 / 2423

页数：5

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[2] CLAASSEN WAP, 1983, 4TH P EUR C CHEM VAP
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