CHARACTERIZATION OF PLASMA SILICON-NITRIDE LAYERS

被引:153
作者
CLAASSEN, WAP
VALKENBURG, WGJN
HABRAKEN, FHPM
TAMMINGA, Y
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D O I
10.1149/1.2119600
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2419 / 2423
页数:5
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