THE HOMOGENEOUS DISTRIBUTION OF NON-METALLIC BONDS IN AS-DEPOSITED NICR-O RESISTIVE FILMS

被引:11
作者
DINTNER, H
THRUM, F
机构
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1989年 / 111卷 / 02期
关键词
D O I
10.1002/pssa.2211110220
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:551 / 557
页数:7
相关论文
共 42 条
[1]   PRODUCTION OF TANTALUM NITRIDE FILM RESISTORS USING A CONTINUOUS SPUTTERING MACHINE [J].
ABDIN, S ;
VAL, C .
THIN SOLID FILMS, 1979, 57 (02) :327-331
[2]  
ABELES B, 1975, ADV PHYS, V24, P407, DOI 10.1080/00018737500101431
[3]  
ALTSHULER BL, 1985, ELECTRON ELECTRON IN
[4]   AGING MODEL OF REACTIVELY DEPOSITED THIN NI-CR FILMS [J].
BARTUCH, H ;
DINTNER, H ;
NIMMRICHTER, A ;
FROHLICH, F .
THIN SOLID FILMS, 1984, 116 (1-3) :211-218
[5]   PHASE ANALYSIS OF AMORPHOUS RESISTIVE FILMS [J].
BICKNELL, RW .
BRITISH JOURNAL OF APPLIED PHYSICS, 1966, 17 (06) :775-&
[6]  
BIRJEGA MI, 1971, REV ROUM PHYS, V16, P1229
[7]  
BIRJEGA MI, 1984, REV ROUM PHYS, V29, P219
[8]  
BOGEGOM E, 1983, PHYSICA A, V122, P13
[9]  
Bottger H., 1985, HOPPING CONDUCTION S
[10]   THIN-FILM NICR RESISTOR [J].
BUCZEK, DM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :370-372