AGING MODEL OF REACTIVELY DEPOSITED THIN NI-CR FILMS

被引：7

作者：

BARTUCH, H ^{[1
]}

DINTNER, H ^{[1
]}

NIMMRICHTER, A ^{[1
]}

FROHLICH, F ^{[1
]}

机构：

[1] KOMBINAT VOLKSEIGENER BETRIEB KERAM WERKE HERMSDORF,DDR-6530 HERMSDORF,GER DEM REP

来源：

THIN SOLID FILMS | 1984年 / 116卷 / 1-3期

关键词：

D O I：

10.1016/0040-6090(84)90431-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：211 / 218

页数：8

共 14 条

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[2]

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[3] FLIGHT QUALITY NICKEL-CHROMIUM FILMS WITH SHEET RESISTANCES UP TO 420 OHMS PER SQUARE [J].

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[4] HIGH-POWER DENSITY THIN-FILM RESISTORS [J].

FAITH, TJ .

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[5] ELECTRICAL AND STRUCTURAL-PROPERTIES OF NICR THIN-FILM RESISTORS REACTIVELY SPUTTERED IN O2 [J].

HARDY, WR ;

MURTI, DK .

THIN SOLID FILMS, 1974, 20 (02) :345-362

[6] STRUCTURAL AND ELECTRICAL PROPERTIES OF EVAPORATED CR-NI FILMS AS A FUNCTION OF GAS PRESSURE [J].

LASSAK, L ;

HIEBER, K .

THIN SOLID FILMS, 1973, 17 (01) :105-111

[7]

LEVINSON DW, 1963, PHYS FAIL ELECTRON, P108

[8]

LEWIS CW, 1963, PHYS FAIL ELECTRON, P11

[9] ELECTRICAL AND COMPOSITIONAL STRUCTURE OF THIN NI-CR FILMS [J].

NOCERINO, G ;

SINGER, KE .

THIN SOLID FILMS, 1979, 57 (02) :343-348

[10]

NOCERINO G, 1979, J VAC SCI TECHNOL, V16, P145

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