INTEGRATED-CIRCUIT DIAGNOSIS USING FOCUSED ION-BEAMS

[1] INTEGRATED-CIRCUIT REPAIR USING FOCUSED ION-BEAM MILLING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 181 - 184

[2] ALUMINUM-LINE CUTTING END-MONITOR UTILIZING SCANNING-ION-MICROSCOPE VOLTAGE-CONTRAST IMAGES [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (02): : L133 - L134

[3] Lukianoff G. V., 1975, Scanning Electron Microscopy 1975, P465

[4] ORLOFF J, 1984, 2ND EL BEAM TEST COU

[5] WAGNER A, 1983, P SOC PHOTO-OPT INST, V393, P167, DOI 10.1117/12.935108

[6] ELECTRON-BEAM TESTING OF VLSI CIRCUITS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 549 - 559

[1] INTEGRATED-CIRCUIT REPAIR USING FOCUSED ION-BEAM MILLING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 181 - 184

[2] ALUMINUM-LINE CUTTING END-MONITOR UTILIZING SCANNING-ION-MICROSCOPE VOLTAGE-CONTRAST IMAGES [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (02): : L133 - L134

[3] Lukianoff G. V., 1975, Scanning Electron Microscopy 1975, P465

[4] ORLOFF J, 1984, 2ND EL BEAM TEST COU

[5] WAGNER A, 1983, P SOC PHOTO-OPT INST, V393, P167, DOI 10.1117/12.935108

[6] ELECTRON-BEAM TESTING OF VLSI CIRCUITS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 549 - 559