TEMPORAL PROFILE OF OPTICAL-TRANSMISSION PROBE FOR PULSED-LASER HEATING OF AMORPHOUS-SILICON FILMS

被引：24

作者：

PARK, HK

XU, XF

GRIGOROPOULOS, CP

DO, N

KLEES, L

LEUNG, PT

TAM, AC

机构：

[1] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120

[2] TH DARMSTADT,INST ANGEW PHYS,W-6100 DARMSTADT,GERMANY

[3] PORTLAND STATE UNIV,DEPT PHYS,PORTLAND,OR 97207

来源：

APPLIED PHYSICS LETTERS | 1992年 / 61卷 / 07期

关键词：

D O I：

10.1063/1.107786

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The transient temperature field development during heating of an amorphous silicon (a-Si) film, deposited on a fused quartz substrate by pulsed excimer laser irradiation is studied. Experimental optical transmission data are compared with heat transfer modeling results. The temperature-dependence of the material complex refractive index through the thin film thickness is taken into account.

引用

页码：749 / 751

页数：3

共 15 条

[11] CALCULATIONS OF MELTING THRESHOLD ENERGIES OF CRYSTALLINE AND AMORPHOUS MATERIALS DUE TO PULSED-LASER IRRADIATION [J].