RF MULTIPOLAR PLASMA FOR BROAD AND REACTIVE ION-BEAMS

被引：20

作者：

LEJEUNE, C

GRANDCHAMP, JP

KESSI, O

GILLES, JP

机构：

来源：

VACUUM | 1986年 / 36卷 / 11-12期

关键词：

D O I：

10.1016/0042-207X(86)90122-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：837 / 840

页数：4

共 18 条

[1] THE PERFORMANCE OF A MICROWAVE ION-SOURCE IMMERSED IN A MULTICUSP STATIC MAGNETIC-FIELD [J].

DAHIMENE, M ;

ASMUSSEN, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :126-130

[2]

FOSNIGHT VV, 1983, EDB700205 TWR REP

[3]

GILDENBLAT G, 1983, J APPL PHYS, V54, P1885

[4] BEAM OPTICS FOR ION EXTRACTION WITH A HIGH-VOLTAGE RATIO ACCELERATION DECELERATION SYSTEM [J].

GREEN, TS .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1976, 9 (07) :1165-1171

[5] INTENSE ION-BEAMS [J].

GREEN, TS .

REPORTS ON PROGRESS IN PHYSICS, 1974, 37 (10) :1257-+

[6]

HARPER JME, 1981, J ELECTROCHEM SOC, V128, P1077, DOI 10.1149/1.2127554

[7]

HEATH BA, 1982, J ELECTRONCHEM SOC, V129, P386

[8]

KOHLER K, 1985, J APPL PHYS, V57, P59, DOI 10.1063/1.335396

[9] ELECTROSTATIC REFLEX PLASMA SOURCE AS A PLASMA BRIDGE NEUTRALIZER [J].

LEJEUNE, C ;

GRANDCHAMP, JP ;

KESSI, O .

VACUUM, 1986, 36 (11-12) :857-860

[10] TRIPLASMATRON SOURCES FOR BROAD AND REACTIVE ION-BEAMS [J].

LEJEUNE, C ;

GRANDCHAMP, JP ;

KESSI, O ;

GILLES, JP .

VACUUM, 1986, 36 (11-12) :851-855

← 1 2 →