TRIPLASMATRON SOURCES FOR BROAD AND REACTIVE ION-BEAMS

被引：12

作者：

LEJEUNE, C

GRANDCHAMP, JP

KESSI, O

GILLES, JP

机构：

来源：

VACUUM | 1986年 / 36卷 / 11-12期

关键词：

D O I：

10.1016/0042-207X(86)90125-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：851 / 855

页数：5

共 15 条

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[2]

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[3]

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[5] THE PERFORMANCE OF A MICROWAVE ION-SOURCE IMMERSED IN A MULTICUSP STATIC MAGNETIC-FIELD [J].

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[7]

HEATH BA, 1982, J ELECTRONCHEM SOC, V129, P386

[8] ELECTROSTATIC REFLEX PLASMA SOURCE AS A PLASMA BRIDGE NEUTRALIZER [J].

LEJEUNE, C ;

GRANDCHAMP, JP ;

KESSI, O .

VACUUM, 1986, 36 (11-12) :857-860

[9] THEORETICAL AND EXPERIMENTAL STUDY OF DUOPLASMATRON ION-SOURCE .1. MODEL OF DUOPLASMATRON DISCHARGE [J].

LEJEUNE, C .

NUCLEAR INSTRUMENTS & METHODS, 1974, 116 (03) :417-428

[10] RF MULTIPOLAR PLASMA FOR BROAD AND REACTIVE ION-BEAMS [J].

LEJEUNE, C ;

GRANDCHAMP, JP ;

KESSI, O ;

GILLES, JP .

VACUUM, 1986, 36 (11-12) :837-840

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