EXCIMER LASER PROJECTION ETCHING OF GAAS

被引：32

作者：

BREWER, PD ^{[1
]}

MCCLURE, D ^{[1
]}

OSGOOD, RM ^{[1
]}

机构：

[1] COLUMBIA UNIV,MICROELECTR SCI LABS,NEW YORK,NY 10027

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 13期

关键词：

D O I：

10.1063/1.97552

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：803 / 805

页数：3

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