CHEMICAL VAPOR-DEPOSITION OF COPPER FROM 1,5-CYCLOOCTADIENE COPPER(I) HEXAFLUOROACETYLACETONATE

被引：123

作者：

REYNOLDS, SK ^{[1
]}

SMART, CJ ^{[1
]}

BARAN, EF ^{[1
]}

BAUM, TH ^{[1
]}

LARSON, CE ^{[1
]}

BROCK, PJ ^{[1
]}

机构：

[1] ABM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 18期

关键词：

D O I：

10.1063/1.106060

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have studied the chemical vapor deposition of copper from 1,5-cyclooctadiene Cu(I) hexafluoroacetylacetonate, a moderately volatile yellow cystalline solid. It yields pure copper by pyrolytic decomposition at 150-250-degrees-C, produces copper films with near bulk resistivity, and has the advantage of being air stable at room temperature.

引用

页码：2332 / 2334

页数：3

共 11 条

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