ELECTRONIC STATES AND MICROSTRUCTURE AT THE SILICIDE-SILICON INTERFACE

被引：34

作者：

HO, PS

RUBLOFF, GW

机构：

来源：

THIN SOLID FILMS | 1982年 / 89卷 / 04期

关键词：

D O I：

10.1016/0040-6090(82)90324-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：433 / 446

页数：14

共 66 条

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