CHARACTERISTICS OF CDTE GROWN ON SI BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引:35
作者
CHOU, RL [1 ]
LIN, MS [1 ]
CHOU, KS [1 ]
机构
[1] NATL TSING HUA UNIV,DEPT CHEM ENGN,HSINCHU 300,TAIWAN
关键词
D O I
10.1063/1.96494
中图分类号
O59 [应用物理学];
学科分类号
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页码:523 / 525
页数:3
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