DEPOSITION OF AMORPHOUS COZRNB FILMS USING CMF MAGNETRON SPUTTERING TECHNIQUE

被引：4

作者：

TAKAHASHI, T ^{[1
]}

YONEDA, M ^{[1
]}

NAOE, M ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,FAC ENGN,TOKYO 152,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 03期

关键词：

D O I：

10.1143/JJAP.28.379

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：379 / 383

页数：5

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