DEEP UV ABLATION OF PMMA RESISTS

被引：18

作者：

LANAGAN, M

LINDSEY, S

VISWANATHAN, NS

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 02期

关键词：

D O I：

10.1143/JJAP.22.L67

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L67 / L69

页数：3

共 11 条

[1]

BOWDEN MJ, 1979, SOLID STATE TECHNOL, V22, P72

[2]

CROWLEY PRE, 1952, P ROY SOC A, V210, P461

[3] TEMPERATURE EFFECTS ON POSITIVE ELECTRON RESISTS IRRADIATED WITH ELECTRON-BEAM AND DEEP-UV LIGHT [J].

HARADA, K ;

SUGAWARA, S .

JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (05) :1441-1452

[4] PRACTICING THE NOVOLAC DEEP-UV PORTABLE CONFORMABLE MASKING TECHNIQUE [J].

LIN, BJ ;

BASSOUS, E ;

CHAO, VW ;

PETRILLO, KE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1313-1319

[5] NOVEL TECHNIQUE FOR MEASURING TH DIFFUSION CONSTANT OF OXYGEN IN POLYMER-FILMS [J].

MACCALLUM, JR ;

RUDKIN, AL .

EUROPEAN POLYMER JOURNAL, 1978, 14 (09) :655-656

[6]

MOREAU W, 1982, SPIE P, V333, P2

[7]

SCHANABEL W, ASPECTS DEGRADATION, P149

[8]

TSUDA M, 1980, ACS SYM SER, V121, P281

[9] DIRECT ETCHING OF RESISTS BY UV-LIGHT [J].

UENO, N ;

KONISHI, S ;

TANIMOTO, K ;

SUGITA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (10) :L709-L712

[10] RADIATION-CHEMISTRY OF POLYMER DEGRADATION PROCESSES - MOLECULAR-WEIGHT DISTRIBUTION EFFECTS [J].

VISWANATHAN, NS .

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1976, 14 (06) :1553-1555

← 1 2 →