EVALUATION OF FERMI-LEVEL IN DOPED FILMS OF A-SIC-H BY X-RAY PHOTOEMISSION SPECTROSCOPY

被引：7

作者：

FUKADA, N ^{[1
]}

FUKUSHIMA, Y ^{[1
]}

IMURA, T ^{[1
]}

HIRAKI, A ^{[1
]}

机构：

[1] OSAKA UNIV, FAC ENGN, DEPT ELECT ENGN, SUITA, OSAKA 565, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1983年 / 22卷 / 11期

关键词：

D O I：

10.1143/JJAP.22.L745

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L745 / L747

页数：3

共 17 条

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