INTERFEROMETRIC NANOMETER ALIGNMENT FOR A WAFER STEPPER BY 2 WAVE-FRONT RECONSTRUCTION ONTO DEFORMED WAFER GRATINGS

被引：2

作者：

NOMURA, N ^{[1
]}

YAMASHITA, K ^{[1
]}

YAMADA, Y ^{[1
]}

SUZUKI, M ^{[1
]}

TAKEMOTO, T ^{[1
]}

机构：

[1] MATSUSHITA ELECT IND CO LTD,PROD ENGN LAB,MORIGUCHI,OSAKA 570,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 06期

关键词：

D O I：

10.1143/JJAP.26.959

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：959 / 964

页数：6

共 6 条

DOHI, T ;

SUZUKI, T .

APPLIED OPTICS, 1971, 10 (05) :1137-&

[2] NEW INTERFEROMETRIC ALIGNMENT TECHNIQUE [J].

FLANDERS, DC ;

SMITH, HI ;

AUSTIN, S .

NOMURA, N ;

MATSUMURA, T ;

YONEZAWA, T ;

KUGIMIYA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1985, 24 (11) :1555-1560

[4]

TRUTNA WR, 1984, P SOC PHOTO-OPT INST, V470, P62, DOI 10.1117/12.941888

[5]

WITTEKOEK S, 1985, P SOC PHOTOOPTICAL I, V538, P28

[6]

YAMASHITA K, 1986, 18TH INT C SOL STAT, P25