LOW-VOLTAGE TRIODE SPUTTERING WITH A CONFINED PLASMA .5. APPLICATION TO BACKSPUTTER DEFINITION

被引：16

作者：

TISONE, TC ^{[1
]}

CRUZAN, PD ^{[1
]}

机构：

[1] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 03期

关键词：

Compendex;

D O I：

10.1116/1.568646

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

METALS AND ALLOYS

引用

页码：677 / 688

页数：12

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[8] GROWTH OF TOPOGRAPHY DURING SPUTTERING OF AMORPHOUS SOLIDS .4. GENERALIZED THEORY [J].

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[9]

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