DEPOSITION OF HARD CARBON-FILMS BY THE RF GLOW-DISCHARGE METHOD

Hard carbon films were produced by the rf glow discharge plasma decomposition of the hydrocarbon gases CH//4 and C//2H//4 diluted with H//2. Optical emission spectra and ionic densities in the plasmas were measured during the deposition of the carbon films, and a correlation between the carbon film's properties and the plasma's condition was established. From these results, ionic species were concluded to be very important for the formation of hard carbon films. The films were examined by transmission electron microscopy, and the growth of diamond particles was observed in the hard films. The CH//3 radicals were suggested to promote the growth of diamond. The hard films obtained had about half the hardness of diamond. Several properties of the hard carbon films were also examined.