THERMAL EVOLUTION OF THE GD/SI(111) INTERFACE - FORMATION OF EPITAXIAL GD SILICIDE

被引：33

作者：

HENLE, WA ^{[1
]}

RAMSEY, MG ^{[1
]}

NETZER, FP ^{[1
]}

CIMINO, R ^{[1
]}

BRAUN, W ^{[1
]}

机构：

[1] MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER

来源：

SOLID STATE COMMUNICATIONS | 1989年 / 71卷 / 08期

关键词：

D O I：

10.1016/0038-1098(89)91812-7

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：657 / 660

页数：4

共 19 条

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