STRUCTURE AND MECHANICAL-PROPERTIES OF HYDROGENATED CARBON-FILMS PREPARED BY MAGNETRON SPUTTERING

被引:52
作者
MARCHON, B [1 ]
VO, PN [1 ]
KHAN, MR [1 ]
AGER, JW [1 ]
机构
[1] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,CTR ADV MAT,BERKELEY,CA 94720
关键词
D O I
10.1109/20.278773
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Hydrogenated thin carbon films have been prepared by DC-magnetron sputtering in an hydrogen-containing Argon atmosphere. A monotonic decrease in friction buildup as well as an increase in abrasion resistance is observed for increasing hydrogen proportion in Argon, from 0 to 5%. At the same time, Raman data shows higher sp3 character and an increase in hydrogen content in the film, as monitored with FTIR, is observed. Resistivity measurements also show, a transition from conductor to insulator. For very high hydrogen content, the film becomes increasingly softer. These data are attributed to an initial increase in the sp3/sp2 bonding ratio, followed by a loss of three-dimensional cross-linking eventually leading to polymerization.
引用
收藏
页码:5160 / 5162
页数:3
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