STRUCTURAL MORPHOLOGY AND ELECTRONIC-PROPERTIES OF THE SI-CR INTERFACE

被引:86
作者
FRANCIOSI, A [1 ]
PETERMAN, DJ [1 ]
WEAVER, JH [1 ]
MORUZZI, VL [1 ]
机构
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
关键词
D O I
10.1103/PhysRevB.25.4981
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:4981 / 4993
页数:13
相关论文
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