THE EFFECT OF THE ATOMIC INCIDENT ANGLE UPON THE MICROSTRUCTURE OF THICK BERYLLIUM DEPOSITS PRODUCED BY PHYSICAL VAPOR-DEPOSITION

被引：7

作者：

NIEH, TG

KARLAK, RF

VIDOZ, AE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 04期

关键词：

D O I：

10.1116/1.571878

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：980 / 985

页数：6

共 14 条

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[8] EFFECT OF VAPOR INCIDENCE ANGLES ON PROFILE AND PROPERTIES OF CONDENSED FILMS [J].

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SHALDERVAN, AI .

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[9]

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[10] INFLUENCES OF SURFACE-TOPOGRAPHY AND ANGLE OF ADATOM INCIDENCE ON GROWTH-STRUCTURE IN SPUTTERED CHROMIUM [J].

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