MASS-RESOLVED ION ENERGY MEASUREMENTS AT THE GROUNDED ELECTRODE OF AN ARGON RF PLASMA

被引:26
作者
SNIJKERS, RJMM
VANSAMBEEK, MJM
KROESEN, GMW
DEHOOG, FJ
机构
[1] Eindhoven University of Technology, Department of Physics, 5600 MB Eindhoven
关键词
D O I
10.1063/1.110087
中图分类号
O59 [应用物理学];
学科分类号
摘要
The mass-resolved ion energy distribution (IED) at the grounded electrode has been determined in a 13.56-MHz parallel-plate plasma in argon. The IED is determined of Ar+, Ar2+, Ar2+, ArH+, H3O+, and H3+ for several plasma conditions. At pressures higher than 10 mTorr, collisions in the sheath become important. The IED of Ar+ is particularly defined by charge exchange collisions in the sheath while the IED of the other ions shows only features generated by elastic scattering. This is confirmed by Monte Carlo simulations. The measurements clearly show the necessity of simultaneous mass and energy separation, rather than the nonmass-resolved IED reported in the literature.
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页码:308 / 310
页数:3
相关论文
共 20 条
[1]   ION ENERGY-DISTRIBUTIONS IN RADIOFREQUENCY DISCHARGES [J].
FIELD, D ;
KLEMPERER, DF ;
MAY, PW ;
SONG, YP .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (01) :82-92
[2]  
GOEDHEER W, 1990, 10TH P EUR SECT C AT, P80
[3]   ION TRANSIT THROUGH CAPACITIVELY COUPLED AR SHEATHS - ION CURRENT AND ENERGY-DISTRIBUTION [J].
GREENE, WM ;
HARTNEY, MA ;
OLDHAM, WG ;
HESS, DW .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) :1367-1371
[4]   MEASUREMENTS OF NEGATIVE-ION DENSITIES IN 13.56-MHZ RF PLASMAS OF CF4, C2F6, CHF3, AND C3F8 USING MICROWAVE RESONANCE AND THE PHOTODETACHMENT EFFECT [J].
HAVERLAG, M ;
KONO, A ;
PASSCHIER, D ;
KROESEN, GMW ;
GOEDHEER, WJ ;
DEHOOG, FJ .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (07) :3472-3480
[5]   RF MODULATION OF POSITIVE-ION ENERGIES IN LOW-PRESSURE DISCHARGES [J].
INGRAM, SG ;
BRAITHWAITE, NS .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (11) :5519-5527
[6]   ENERGY-RESOLVED ANGULAR-DISTRIBUTIONS OF O+ IONS AT THE RADIO-FREQUENCY-POWERED ELECTRODE IN REACTIVE ION ETCHING [J].
JANES, J ;
HUTH, C .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (05) :3086-3091
[7]  
KOHLER K, 1985, J APPL PHYS, V57, P59, DOI 10.1063/1.335396
[8]  
KOHLER K, 1985, J APPL PHYS, V58, P3350, DOI 10.1063/1.335797
[9]   TEMPORAL BEHAVIOR OF THE ELECTRON AND NEGATIVE-ION DENSITIES IN A PULSED RADIOFREQUENCY CF4 PLASMA [J].
KONO, A ;
HAVERLAG, M ;
KROESEN, GMW ;
DEHOOG, FJ .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (06) :2939-2946