THERMAL-WAVE MEASUREMENTS AND MONITORING OF TASIX SILICIDE FILM PROPERTIES

被引：6

作者：

SMITH, WL ^{[1
]}

OPSAL, J ^{[1
]}

ROSENCWAIG, A ^{[1
]}

STIMMELL, JB ^{[1
]}

ALLISON, JC ^{[1
]}

BHANDIA, AS ^{[1
]}

机构：

[1] NATL SEMICOND CORP,SANTA CLARA,CA 95051

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1984年 / 2卷 / 04期

关键词：

D O I：

10.1116/1.582866

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：710 / 713

页数：4

共 7 条

[1]

ASHCROFT NW, SOLID STATE PHYSICS, P20

[2] STOICHIOMETRIC SHIFTS IN COSPUTTERED REFRACTORY SILICIDE FILMS DURING SUBSEQUENT HEAT-TREATMENT [J].

BHANDIA, AS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04) :766-770

[3] MICROSTRUCTURAL INVESTIGATIONS OF REFRACTORY-METAL SILICIDE FILMS ON SILICON [J].

MAGEE, TJ ;

WOOLHOUSE, GR ;

KAWAYOSHI, HA ;

NIEMEYER, IC ;

RODRIGUES, B ;

ORMOND, RD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04) :756-761

[4]

MURARKA SP, SILICIDES VLSI APPLI, P150

[5] THERMAL-WAVE DETECTION AND THIN-FILM THICKNESS MEASUREMENTS WITH LASER-BEAM DEFLECTION [J].

OPSAL, J ;

ROSENCWAIG, A ;

WILLENBORG, DL .

APPLIED OPTICS, 1983, 22 (20) :3169-3176

[6] THERMAL-WAVE DEPTH PROFILING - THEORY [J].

OPSAL, J ;

ROSENCWAIG, A .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (06) :4240-4246

[7]

STIMMELL JB, UNPUB THIN SOLID FIL

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