MASS ANALYSIS OF SPUTTERED PARTICLES

被引：26

作者：

SMITH, AJ

MARSHALL, DJ

CAMBEY, LA

机构：

来源：

关键词：

D O I：

10.1063/1.1702772

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2489 / &

共 9 条

[1]

ALMEN O, 1957, NUCL INSTRUM METHODS, V1, P302

[2] SECONDARY POSITIVE ION EMISSION FROM METAL SURFACES [J].

BRADLEY, RC .

[3] SPUTTERING OF SURFACES BY POSITIVE ION BEAMS OF LOW ENERGY [J].

HONIG, RE .

[4]

KOPITZKI K, 1962, Z NATURF, VA 17, P346

[5] A MASS SPECTROMETER FOR ISOTOPE AND GAS ANALYSIS [J].

NIER, AO .

[6]

SMITH A, TO BE PUBLISHED

STANTON, HE .

[8]

STUART RV, 1962, 1962 VAC S T, P160

[9] ISOTOPIC ABUNDANCE DETERMINATION OF COPPER BY SPUTTERING [J].

WHITE, FA ;

ROURKE, FM ;

SHEFFIELD, JC .