IN-SITU INVESTIGATION OF ZNS DEPOSITION ON MICA BY SUCCESSIVE IONIC LAYER ADSORPTION AND REACTION METHOD AS STUDIED WITH ATOMIC-FORCE MICROSCOPY

被引：13

作者：

RESCH, R

PROHASKA, T

FRIEDBACHER, G

GRASSERBAUER, M

KANNIAINEN, T

LINDROOS, S

LESKELA, M

NIINISTO, L

BROEKAERT, JAC

机构：

[1] VIENNA UNIV TECHNOL,INST ANALYT CHEM,A-1060 VIENNA,AUSTRIA

[2] HELSINKI UNIV,DEPT CHEM,SF-00014 HELSINKI,FINLAND

[3] HELSINKI UNIV TECHNOL,INORGAN & ANALYT CHEM LAB,SF-02150 ESPOO,FINLAND

[4] UNIV DORTMUND,DEPT CHEM,D-44221 DORTMUND,GERMANY

来源：

FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1995年 / 353卷 / 5-8期

关键词：

D O I：

10.1007/BF00321369

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The growth of ZnS thin films on a mica substrate in a Successive Ionic Layer Adsorption and Reaction (SILAR) process has been studied. The films were deposited in-situ using the commercial AFM liquid cell as flow-through reactor. Reactants and rinsing water were exchanged in the cell continuously by a computer controlled valve system. In this way the film growth could be observed directly in a time resolved sequence of images taken after 1 up to 100 cycles. The results show that the stability of the films increases between 1 and 30 cycles and that a full coverage of the surface is reached after approximately 50 cycles.

引用

页码：772 / 777

页数：6

共 11 条

[1]

[Anonymous], 1987, Patent US, Patent No. 4675207

[2] SURFACE-ANALYSIS WITH ATOMIC-FORCE MICROSCOPY THROUGH MEASUREMENT IN AIR AND UNDER LIQUIDS [J].