LAYERED AND HOMOGENEOUS FILMS OF ALUMINUM AND ALUMINUM SILICON WITH TITANIUM AND TUNGSTEN FOR MULTILEVEL INTERCONNECTS

被引:39
作者
GARDNER, DS [1 ]
MICHALKA, TL [1 ]
SARASWAT, KC [1 ]
BARBEE, TW [1 ]
MCVITTIE, JP [1 ]
MEINDL, JD [1 ]
机构
[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
关键词
D O I
10.1109/T-ED.1985.21927
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:174 / 183
页数:10
相关论文
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