Structure and stability of the out-of-phase boundary in a surface superlattice, Si(111)root 3x root 3R30 degrees-Ag

被引：14

作者：

Nakayama, T ^{[1
]}

Watanabe, S ^{[1
]}

Aono, M ^{[1
]}

机构：

[1] JRDC,ERATO AONO ATOMCRAFT PROJECT,TOKYO,TOKYO 173,JAPAN

来源：

SURFACE SCIENCE | 1995年 / 344卷 / 1-2期

关键词：

epitaxy; growth; scanning tunneling microscopy; silicon; silver; surface defects; surface relaxation and reconstruction; surface thermodynamics;

D O I：

10.1016/0039-6028(95)00814-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The structure, stability, and formation mechanism of the out-of-phase boundary (OPE) in the Si(111)root 3x root 3R30 degrees-Ag surface-superlattice structure are discussed on the basis of scanning tunneling microscopy observations. An important factor that determines the density of the OPE is also discussed.

引用

页码：143 / 148

页数：6

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