NBCL(S) AS A PRECURSOR IN ATOMIC LAYER EPITAXY

被引：55

作者：

ELERS, KE

RITALA, M

LESKELA, M

RAUHALA, E

机构：

[1] UNIV HELSINKI,DEPT CHEM,POB 6,SF-00014 HELSINKI,FINLAND

[2] UNIV HELSINKI,ACCELERATOR LAB,SF-00014 HELSINKI,FINLAND

来源：

APPLIED SURFACE SCIENCE | 1994年 / 82-3卷

基金：

芬兰科学院;

关键词：

D O I：

10.1016/0169-4332(94)90260-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

NbCl5 was examined as a niobium source for ALE growth of NbN and Nb2O5 films and for Nb doping of TiO2 and SnO2 films. The growth of NbN films was successfully accomplished both with and without reducing Zn pulses between the NbCl5 and NH3 pulses. The polycrystalline NbN films were nearly stoichiometric and free of chlorine residues. The main problem met was the low growth rate, only about 0.2 angstrom/cycle. All attempts to employ NbCl5 as a precursor in oxide processes failed which, with the aid of thermodynamic calculations, was ascribed to the stability of NbOCl3 and NbO2Cl intermediate products.

引用

页码：468 / 474

页数：7

共 26 条

[11] FABRICATION OF NBN THIN-FILMS BY REACTIVE SPUTTERING
MAUNG, WN
BUTLER, DP
HUANG, CL
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (03): : 615 - 620
[12] NYKANEN E, IN PRESS
[13] TRANSITION-TEMPERATURES AND CRYSTAL-STRUCTURES OF SINGLE-CRYSTAL AND POLYCRYSTALLINE NBNX FILMS
OYA, G
ONODERA, Y
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (03) : 1389 - 1397
[14] PREPARATION OF SINGLE-CRYSTALLINE NBN AND NB4N5 FILMS
OYA, G
ONODERA, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1971, 10 (10) : 1485 - &
[15] DEPTH PROFILES OF DEFECTS IN CDTE(100) OVERLAYERS GROWN BY MOLECULAR-BEAM EPITAXY ON GAAS(100)
RAUHALA, E
KEINONEN, J
RAKENNUS, K
PESSA, M
[J]. APPLIED PHYSICS LETTERS, 1987, 51 (13) : 973 - 974
[16] PROTON BACKSCATTERING AND COMPUTER-DATA ANALYSIS IN THE NON-RUTHERFORD ENERGY REGION
RAUHALA, E
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 40-1 : 790 - 796
[17] GROWTH OF TITANIUM-DIOXIDE THIN-FILMS BY ATOMIC LAYER EPITAXY
RITALA, M
LESKELA, M
NYKANEN, E
SOININEN, P
NIINISTO, L
[J]. THIN SOLID FILMS, 1993, 225 (1-2) : 288 - 295
[18] ZIRCONIUM DIOXIDE THIN-FILMS DEPOSITED BY ALE USING ZIRCONIUM TETRACHLORIDE AS PRECURSOR
RITALA, M
LESKELA, M
[J]. APPLIED SURFACE SCIENCE, 1994, 75 (1-4) : 333 - 340
[19] SHEPPARD LM, 1992, AM CERAM SOC BULL, V71, P85
[20] ABRASION RESISTANCE, MICROHARDNESS AND MICROSTRUCTURES OF SINGLE-PHASE NIOBIUM NITRIDE FILMS
SINGER, IL
BOLSTER, RN
WOLF, SA
SKELTON, EF
JEFFRIES, RA
[J]. THIN SOLID FILMS, 1983, 107 (02) : 207 - 215

← 1 2 3 →