INVESTIGATIONS ON THE EFFECTS OF PROCESS PARAMETERS ON THE HIGH-TEMPERATURE AND WEAR BEHAVIOR OF PVD COATINGS

被引:7
作者
KLEER, G
DOLL, W
机构
关键词
D O I
10.1002/mawe.19930240305
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Metal nitride coatings are of particular interest for the improvement of the service behavior of forming tools for the thermoplastic molding of optical components from anorganic glasses at high temperatures. In the present study AlN and TiN coatings were deposited on steel, glass and silicon substrates in reactive sputtering processes by variation of the process parameters total pressure, partial pressures of nitrogen and argon, substrate temperature and distance between target and substrate. In particular the effect of the process parameters on the film stresses as well as the mechanical behavior of films with various tensile and residual stresses have been analyzed. A transition f rom tensile to compressive stresses by variation of the total pressure and of the distance between target and substrate was obtained for AlN coatings prepared by a reactive d.c. tetrode process. In coatings with compressive residual stresses an increased resistance to microcrack initiation and improved wear behavior could be achieved.
引用
收藏
页码:80 / 85
页数:6
相关论文
共 10 条
[1]  
AQUILINA T, 1986, PHOTON SPECTRA, V9, P73
[2]  
CHOLLET L, 1986, HARTSTOFFSCHICHTEN V, P247
[3]  
DANSLAX, 1967, TASCHENBUCH CHEM PHY, V1, P1
[4]   PERFORMANCE AND ANALYSIS OF RECORDING MICROHARDNESS TESTS [J].
FROHLICH, F ;
GRAU, P ;
GRELLMANN, W .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 42 (01) :79-89
[5]   INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE [J].
HOFFMAN, DW ;
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :355-358
[6]  
HOLLECK H, 1986, Z WERKSTOFFTECH, V17, P334
[7]   STRESS DEPENDENCE OF REACTIVELY SPUTTERED ALUMINUM NITRIDE THIN-FILMS ON SPUTTERING PARAMETERS [J].
HUFFMAN, GL ;
FAHNLINE, DE ;
MESSIER, R ;
PILIONE, LJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :2252-2255
[8]  
KULGE U, 1989, HUTTE GRUNDLAGEN ING, pE66
[9]  
POLLICOVE HM, 1988, P SOC PHOTO-OPT INS, V896, P158
[10]   INTERNAL-STRESSES IN TITANIUM, NICKEL, MOLYBDENUM, AND TANTALUM FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J].
THORNTON, JA ;
HOFFMAN, DW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :164-168