STRAIN SYMMETRIZATION EFFECTS IN PSEUDOMORPHIC SI1-YCY/SI1-XGEX SUPERLATTICES

被引:24
作者
EBERL, K [1 ]
IYER, SS [1 ]
LEGOUES, FK [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.111051
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on strain and stability measurements on pseudomorphic Si1-yCy/Si1-xGex superlattices which are synthesized by solid source molecular beam epitaxy on silicon (100) substrate. The strain in the superlattices alternates between tensile and compressive in the individual Si1-yCy and Si1-xGex alloy layers, respectively. A symmetrical strain distribution can be achieved directly on silicon by adjusting the carbon and the germanium content and/or the thickness of the individual layers. X-ray diffraction and transmission electron microscopy are applied to investigate the structural properties and the thermal stability.
引用
收藏
页码:739 / 741
页数:3
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