A NEW SILICONE-BASED NEGATIVE RESIST (SNR) FOR 2-LAYER RESIST SYSTEM

[1] BOWDEN MJ, 1981, SOLID STATE TECHNOL, V24, P73

[2] HATZAKIS M, 1981, SOLID STATE TECHNOL, V24, P74

[3] HATZAKIS M, 1981, SEP P INT C MICR ENG, P386

[4] HATZAKIS M, 1983, IBM TECH DISCL B, V26, P479

[5] HAVAS J, 1976, ELECTROCHEM SOC EXTE, V762, P743

[6] HAYASAKA T, 1982, ELECTROCHEMICAL SOC, P347

[7] HIGH-PERFORMANCE ELECTRON NEGATIVE RESIST, CHLOROMETHYLATED POLYSTYRENE - A STUDY ON MOLECULAR-PARAMETERS [J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (03) : 937 - 949

[8] HIGH MOLECULAR-WEIGHT REACTIVE POLY(DIPHENYLSILOXANE) [J]. MACROMOLECULES, 1984, 17 (07) : 1412 - 1413

[9] LIN BJ, 1983, SOLID STATE TECHNOL, V26, P105

[10] HYBRID E-BEAM-DEEP-UV EXPOSURE USING PORTABLE CONFORMABLE MASKING (PCM) TECHNIQUE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1669 - 1671

[1] BOWDEN MJ, 1981, SOLID STATE TECHNOL, V24, P73

[2] HATZAKIS M, 1981, SOLID STATE TECHNOL, V24, P74

[3] HATZAKIS M, 1981, SEP P INT C MICR ENG, P386

[4] HATZAKIS M, 1983, IBM TECH DISCL B, V26, P479

[5] HAVAS J, 1976, ELECTROCHEM SOC EXTE, V762, P743

[6] HAYASAKA T, 1982, ELECTROCHEMICAL SOC, P347

[7] HIGH-PERFORMANCE ELECTRON NEGATIVE RESIST, CHLOROMETHYLATED POLYSTYRENE - A STUDY ON MOLECULAR-PARAMETERS [J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (03) : 937 - 949

[8] HIGH MOLECULAR-WEIGHT REACTIVE POLY(DIPHENYLSILOXANE) [J]. MACROMOLECULES, 1984, 17 (07) : 1412 - 1413

[9] LIN BJ, 1983, SOLID STATE TECHNOL, V26, P105

[10] HYBRID E-BEAM-DEEP-UV EXPOSURE USING PORTABLE CONFORMABLE MASKING (PCM) TECHNIQUE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1669 - 1671