HIGH-TEMPERATURE STABILITY OF NICALON UNDER AR OR O-2 ATMOSPHERE

The thermal stability of Nicalon NL400 at 1573, 1673 and 1773 K has been studied by TGA and XRD. Under an Ar atmosphere, Nicalon pyrolysed severely to crystallize into beta-SiC involving the generation of both SiO and CO. Under an O-2 atmosphere, the oxide film which formed around Nicalon retarded the pyrolytic reaction of the core. Nicalon coated with a silica film by the previous oxidation treatment pyrolysed hardly at all under an Ar atmosphere, because the film restricted the escape of SiO and CO. Nicalon which was oxidation-treated at 1773 K retained 63% of its original strength after heating at 1773 K under an Ar atmosphere. The amorphous silica film was found to resist rapid thermal cycling between room temperature and elevated temperatures.