ANALYTICAL PERFORMANCE OF A SECONDARY-NEUTRAL MICROPROBE WITH ELECTRON-GAS POSITIONIZATION AND MAGNETIC-SECTOR MASS-SPECTROMETER

被引：21

作者：

BIECK, W ^{[1
]}

GNASER, H ^{[1
]}

OECHSNER, H ^{[1
]}

机构：

[1] UNIV KAISERSLAUTERN,FACHBEREICH PHYS,D-67663 KAISERSLAUTERN,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1994年 / 12卷 / 04期

关键词：

D O I：

10.1116/1.579053

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A secondary-neutral mass spectrometer has been developed which combines postionization by means of an electron gas (plasma) with a high-transmission magnetic mass spectrometer and a finely focused ion beam produced in a Ga liquid-metal ion source. The instrument can be operated in a large-area direct bombardment-mode extracting the sputtering beam out of the plasma, or in a microprobe mode utilizing the focused Ga+ ion beam to effect sputtering. In the former case secondary-neutral intensities of up to 10(9) c/s can be realized; together with the high abundance sensitivity those translate in a detection limit in the few-ppb range. In the microprobe mode, secondary-neutral micrographs have been recorded using a focused 20 keV Ga+ beam with a spot size of less than or similar 1 mum and a current of some nA. From these data an elemental detection sensitivity of 10(-3) is inferred, necessitating image acquisition times of the order of 2500 s.

引用

页码：2537 / 2543

页数：7

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