STUDY OF LANGMUIR-BLODGETT FILMS FOR KRF EXCIMER LASER RESIST

被引：8

作者：

OGAWA, K ^{[1
]}

TAMURA, H ^{[1
]}

HATADA, M ^{[1
]}

ISHIHARA, T ^{[1
]}

机构：

[1] JAPAN ATOM ENERGY RES INST,OSAKA LAB RADIAT,NEYAGAWA,OSAKA 572,JAPAN

来源：

LANGMUIR | 1988年 / 4卷 / 01期

关键词：

D O I：

10.1021/la00079a036

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：195 / 200

页数：6

共 23 条

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