LOW-TEMPERATURE ORGANOMETALLIC VAPOR-PHASE EPITAXIAL-GROWTH OF CDTE USING A NEW ORGANOTELLURIUM SOURCE

被引：33

作者：

KISKER, DW

STEIGERWALD, ML

KOMETANI, TY

JEFFERS, KS

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 23期

关键词：

D O I：

10.1063/1.97766

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1681 / 1683

页数：3

共 18 条

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[7] METALORGANIC GROWTH OF CDTE AND HGCDTE EPITAXIAL-FILMS AT A REDUCED SUBSTRATE-TEMPERATURE USING DIISOPROPYLTELLURIDE [J].

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[8]

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