METALORGANIC GROWTH OF CDTE AND HGCDTE EPITAXIAL-FILMS AT A REDUCED SUBSTRATE-TEMPERATURE USING DIISOPROPYLTELLURIDE

被引：65

作者：

HOKE, WE

LEMONIAS, PJ

机构：

[1] Raytheon Co, Research Div,, Lexington, MA, USA, Raytheon Co, Research Div, Lexington, MA, USA

来源：

APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 04期

关键词：

CARBON-CARBON BONDS - CHEMICAL VAPOR DEPOSITION - DIETHYLTELLURIDE - DIISOPROPYLTELLURE - METALORGANIC COMPOUNDS;

D O I：

10.1063/1.95591

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：398 / 400

页数：3

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