METALLORGANIC CHEMICAL VAPOR-DEPOSITION - A NEW ERA IN OPTICAL COATING TECHNOLOGY

被引:18
作者
DESU, SB
机构
[1] Department of Materials Engineering, Virginia Polytechnic Institute, State University, Blacksburg
关键词
D O I
10.1016/0254-0584(92)90196-F
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The viability of metallorganic chemical vapor deposition process for depositing high quality optical filters at relatively low cost was demonstrated. MOCVD fabricated, refractive oxide filters consisting essentially of alternating layers of Ta2O5 and SiO2 Were found to be suitable for use at high temperatures (> 800-degrees-C) and long operational times (around 3000 h). These films exhibit relatively low stress and low light scattering, are strongly adherent to substrates, and exhibit good optical characteristics. Various technical challenges including stress and absorption minimization, and low cost processing are discussed in detail.
引用
收藏
页码:341 / 345
页数:5
相关论文
共 10 条
  • [1] DECOMPOSITION CHEMISTRY OF TETRAETHOXYSILANE
    DESU, SB
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1989, 72 (09) : 1615 - 1621
  • [2] DESU SB, UNPUB
  • [3] DESU SB, 1990, MATER RES SOC S P, V168
  • [4] STRESSES AND DEFORMATION PROCESSES IN THIN-FILMS ON SUBSTRATES
    DOERNER, MF
    NIX, WD
    [J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1988, 14 (03): : 225 - 268
  • [5] FRACTURE OF SURFACE COATINGS ON A STRAINED SUBSTRATE
    GROSSKREUTZ, JC
    MCNEIL, MB
    [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 355 - +
  • [6] KAWAKATSU A, 1987, Patent No. 4701663
  • [7] OPTICAL COATINGS FOR LARGE AREA INTERFERENCE FILTERS
    LEWIN, R
    HOWSON, RP
    BISHOP, CA
    [J]. VACUUM, 1987, 37 (3-4) : 257 - 260
  • [8] Macleod H. A., 1986, THIN FILM OPTICAL FI
  • [9] MARTIN RL, 1986, OPTIC NEWS 0823
  • [10] VERHEIJEN J, 1987, 10TH P INT CVD C, P977