ON THE THEORY OF THE DIFFUSION OF GOLD INTO DISLOCATED SILICON-WAFERS

被引：5

作者：

SEEGER, A ^{[1
]}

FRANK, W ^{[1
]}

机构：

[1] UNIV STUTTGART, INST THEORET & ANGEW PHYS, D-7000 STUTTGART 80, FED REP GER

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1982年 / 27卷 / 03期

关键词：

D O I：

10.1007/BF00616669

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：171 / 176

页数：6

共 28 条

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[4]

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[8]

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[10] MECHANISM AND KINETICS OF THE DIFFUSION OF GOLD IN SILICON [J].

GOSELE, U ;

FRANK, W ;

SEEGER, A .

APPLIED PHYSICS, 1980, 23 (04) :361-368

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