DRAWING FINE PATTERNS ON N-OCTADECYLACRYLAMIDE LANGMUIR-BLODGETT MULTILAYERS - A NEW CLASS OF ULTRATHIN RESISTS

被引：33

作者：

MIYASHITA, T

YOSHIDA, H

MATSUDA, M

机构：

[1] Tohoku Univ, Sendai, Jpn, Tohoku Univ, Sendai, Jpn

来源：

THIN SOLID FILMS | 1987年 / 155卷 / 02期

关键词：

ACIDS - PHOTORESISTS - POLYMERIZATION - ULTRAVIOLET RADIATION;

D O I：

10.1016/0040-6090(87)90080-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Recently the authors found that the N-octadecylacrylamide (ODA) monomer forms a stable condensed monolayer and that the multilayers deposited onto solid supports were polymerized completely by UV irradiation. The polymerized ODA LB film is a uniform thin film having a high stability against solvents. Fine negative resist patterns due to the polymerized LB film could be drawn. This letter describes preliminary results on the application of the LB film to a deep UV-sensitive negative resist.

引用

页码：L11 / L14

页数：4

共 9 条

[1] POLYMERIZED MONO-MOLECULAR LAYERS - A NEW CLASS OF ULTRATHIN RESINS FOR MICROLITHOGRAPHY [J].