ULTRAMICROHARDNESS MEASUREMENTS ON ALUMINUM FILMS EVAPORATED UNDER VARIOUS CONDITIONS

被引：9

作者：

BANGERT, H ^{[1
]}

KAMINITSCHEK, A ^{[1
]}

WAGENDRISTEL, A ^{[1
]}

BARNA, A ^{[1
]}

BARNA, PB ^{[1
]}

RADNOCZI, G ^{[1
]}

机构：

[1] HUNGARIAN ACAD SCI,H-1361 BUDAPEST 5,HUNGARY

来源：

THIN SOLID FILMS | 1986年 / 137卷 / 02期

关键词：

MICROSCOPIC EXAMINATION - STRENGTH OF MATERIALS;

D O I：

10.1016/0040-6090(86)90019-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The indentation hardness of aluminum films 1. 5 mu m thick, vacuum evaporated under various conditions, was measured in a scanning electron microscope. In a load range between 2 multiplied by 10** minus **4 and 1 multiplied by 10** minus **2 N a pronounced effect of the oxygen content on the Vickers hardness is observed, whereas different substrates have less influence. The interaction of the mechanical properties of the film and the substrate in such combined systems is discussed. For comparison of film and bulk data single-crystal aluminum in (111) and (110) orientations was investigated.

引用

页码：193 / 198

页数：6

共 12 条

[1]

ASCHINGER H, 1981, Patent No. 4304123

[2]

BANGERT H, 1982, VAKUUM-TECH, V31, P200

[3] ULTRALOW-LOAD HARDNESS TESTER FOR USE IN A SCANNING ELECTRON-MICROSCOPE [J].