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ELECTROMIGRATION LIFETIME STUDIES OF SUBMICROMETER-LINEWIDTH AL-CU CONDUCTORS

被引：17
作者：
IYER, SS
TING, CY
机构：
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1984年 / 31卷 / 10期
关键词：
D O I：
10.1109/T-ED.1984.21734
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1468 / 1471
页数：4
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