ELECTROMIGRATION IN ALUMINUM CONDUCTORS WHICH ARE CHAINS OF SINGLE-CRYSTALS

[1] D'Heurle F., 1970, Applied Physics Letters, V16, P80, DOI 10.1063/1.1653108

[2] d'Heurle F. M., 1978, Thin films. Interdiffusion and reactions, P243

[3] ANOMALOUS LARGE GRAINS IN ALLOYED ALUMINUM THIN-FILMS .2. ELECTROMIGRATION AND DIFFUSION IN THIN-FILMS WITH VERY LARGE GRAINS [J]. THIN SOLID FILMS, 1973, 16 (02) : 227 - 236

[4] ANOMALOUS LARGE GRAINS IN ALLOYED ALUMINUM THIN-FILMS .1. SECONDARY GRAIN-GROWTH IN ALUMINUM-COPPER FILMS [J]. THIN SOLID FILMS, 1972, 12 (02) : 399 - &

[5] THE GENERATION OF MIGRATING BOUNDARIES BY VACANCIES [J]. ACTA METALLURGICA, 1980, 28 (12): : 1653 - 1656

[6] IMPURITY DIFFUSION IN ALUMINUM [J]. PHYSICAL REVIEW B, 1970, 1 (08): : 3264 - &

[7] LINEWIDTH DEPENDENCE OF ELECTROMIGRATION IN EVAPORATED AL-0.5-PERCENT CU [J]. APPLIED PHYSICS LETTERS, 1980, 36 (06) : 464 - 466

[8] ANNEALING KINETICS OF VOIDS AND SELF-DIFFUSION COEFFICIENT IN ALUMINUM [J]. PHYSICA STATUS SOLIDI, 1968, 25 (01): : 163 - &

[1] D'Heurle F., 1970, Applied Physics Letters, V16, P80, DOI 10.1063/1.1653108

[2] d'Heurle F. M., 1978, Thin films. Interdiffusion and reactions, P243

[3] ANOMALOUS LARGE GRAINS IN ALLOYED ALUMINUM THIN-FILMS .2. ELECTROMIGRATION AND DIFFUSION IN THIN-FILMS WITH VERY LARGE GRAINS [J]. THIN SOLID FILMS, 1973, 16 (02) : 227 - 236

[4] ANOMALOUS LARGE GRAINS IN ALLOYED ALUMINUM THIN-FILMS .1. SECONDARY GRAIN-GROWTH IN ALUMINUM-COPPER FILMS [J]. THIN SOLID FILMS, 1972, 12 (02) : 399 - &

[5] THE GENERATION OF MIGRATING BOUNDARIES BY VACANCIES [J]. ACTA METALLURGICA, 1980, 28 (12): : 1653 - 1656

[6] IMPURITY DIFFUSION IN ALUMINUM [J]. PHYSICAL REVIEW B, 1970, 1 (08): : 3264 - &

[7] LINEWIDTH DEPENDENCE OF ELECTROMIGRATION IN EVAPORATED AL-0.5-PERCENT CU [J]. APPLIED PHYSICS LETTERS, 1980, 36 (06) : 464 - 466

[8] ANNEALING KINETICS OF VOIDS AND SELF-DIFFUSION COEFFICIENT IN ALUMINUM [J]. PHYSICA STATUS SOLIDI, 1968, 25 (01): : 163 - &