MAGNETIC AND STRUCTURAL STUDIES OF SPUTTERED CO/CU MULTILAYER FILMS

被引：8

作者：

KIM, JD ^{[1
]}

PETFORDLONG, AK ^{[1
]}

JAKUBOVICS, JP ^{[1
]}

EVETTS, JE ^{[1
]}

SOMEKH, R ^{[1
]}

机构：

[1] UNIV CAMBRIDGE,DEPT MET & MAT,CAMBRIDGE CB2 3QZ,ENGLAND

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 76卷 / 10期

关键词：

D O I：

10.1063/1.358246

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The structure and magnetic properties of sputtered Co/Cu multilayer films with various layer thicknesses have been studied. X-ray diffractometry and high resolution electron microscopy show the films to be polycrystalline with a fcc structure and strong [111] texture in the growth direction. The magnetoresistance (MR) of the films depends critically on Cu layer thickness (tCu), with maximum values for films with tCu around 1 nm. Large differences in saturating field are seen for films with tCu and tCo differing by a nominal 0.1 nm. The magnetic domain structure, studied using Lorentz microscopy, shows strong dependence on tCu. High MR-value films showed evidence of antiphase magnetic domain boundaries. The high MR samples show antiferromagnetic coupling, with higher saturating fields than seen in the ferromagnetically coupled films.

引用

页码：6513 / 6515

页数：3

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