STUDIES OF ATOMIC AND MOLECULAR FLUORINE REACTIONS ON SILICON SURFACES

被引:72
作者
STINESPRING, CD
FREEDMAN, A
机构
关键词
D O I
10.1063/1.96700
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:718 / 720
页数:3
相关论文
共 13 条
[2]  
COBURN JW, 1981, PLASMA CHEM PLASMA P, V2, P1
[3]  
Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]
[4]   THE REACTION OF FLUORINE-ATOMS WITH SILICON [J].
FLAMM, DL ;
DONNELLY, VM ;
MUCHA, JA .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) :3633-3639
[5]   ESCA STUDY OF FRACTIONAL MONOLAYER QUANTITIES OF CHEMISORBED GASES ON TUNGSTEN [J].
MADEY, TE ;
YATES, JT ;
ERICKSON, NE .
CHEMICAL PHYSICS LETTERS, 1973, 19 (04) :487-492
[6]   CHEMICAL PROCESSES IN FLUORINE-BASED ETCHING REACTIONS [J].
MCFEELY, FR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :879-880
[7]   PLASMA ETCHING OF SI AND SIO2 - EFFECT OF OXYGEN ADDITIONS TO CF4 PLASMAS [J].
MOGAB, CJ ;
ADAMS, AC ;
FLAMM, DL .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) :3796-3803
[8]   SYNCHROTRON PHOTOEMISSION INVESTIGATION - FLUORINE ON SILICON SURFACES [J].
MORAR, JF ;
MCFEELY, FR ;
SHINN, ND ;
LANDGREN, G ;
HIMPSEL, FJ .
APPLIED PHYSICS LETTERS, 1984, 45 (02) :174-176
[9]   REACTION OF ATOMIC FLUORINE WITH SILICON [J].
NINOMIYA, K ;
SUZUKI, K ;
NISHIMATSU, S ;
OKADA, O .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (03) :1177-1182
[10]   ATTENUATION LENGTHS OF LOW-ENERGY ELECTRONS IN SOLIDS [J].
POWELL, CJ .
SURFACE SCIENCE, 1974, 44 (01) :29-46