MICROLITHOGRAPHIC PATTERNING OF POLYTHIOPHENE FILMS

被引：11

作者：

KUTSCHE, C ^{[1
]}

TARGOVE, J ^{[1
]}

HAALAND, P ^{[1
]}

机构：

[1] USAF, INST TECHNOL, WRIGHT PATTERSON AFB, OH 45433 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 73卷 / 05期

关键词：

D O I：

10.1063/1.354077

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Lithographic patterning of micrometer scale structures in films of polythiophene, an organic material with good linear and nonlinear chi(3) optical properties, has been accomplished by two methods: direct deposition of polythiophene in SiO2 trenches and an oxygen plasma etch of polythiophene through a spin-on glass mask.

引用

页码：2602 / 2604

页数：3

共 13 条

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